Lace Lithography raised $40 million in Series A funding on Monday to develop a chipmaking tool that uses a helium atom beam ...

Design of the laser speckle exposure system. Schematic representation of the laser speckle exposure system, comprising the UV laser, shutter, beam expander, mirror, convex lens, engineering diffuser, ...

Peripheral photoinhibition (PPI) direct laser writing (DLW) is a lithography technique used to fabricate intricate 3D nanostructures that are widely employed in photonics and electronics. PPI-DLW uses ...

Lace, a startup backed by Microsoft, has raised $40 million to build chipmaking equipment based on helium atom beam ...

Heidelberg, Germany – Heidelberg Instruments has made significant performance upgrades to its renowned DWL 66 + direct-write lithography system, solidifying its position as the ultimate research tool ...

PLAINVIEW, N.Y., May 07, 2025 (GLOBE NEWSWIRE) -- Veeco Instruments Inc. (VECO) today announced its received over $35 million of orders for its AP300™ Lithography systems in recent quarters from a ...

Heidelberg, Germany – Heidelberg Instruments, a global player in direct write technology and solution provider for the advanced packaging market, is transforming the semiconductor industry with its ...

Traditional lithography remains a standard in the industry, providing precision and a relatively cost-effective way to create patterns on the wafer when producing very high volumes of chips. However, ...

The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine ...

ASML (NASDAQ:ASML) shipped its first “High NA” extreme ultraviolet lithography systems to Intel (NASDAQ:INTC). The new machines, at more than $300M each, will help chip makers produce smaller and ...