No matter how careful chip design engineers are, and regardless of what implementation tools they use, a verification team will always encounter design rule checking (DRC) errors during the signoff ...
Self-aligned double patterning (SADP) is an alternative double-patterning process to the traditional litho-etch-litho-etch (LELE) approach used in most advanced production nodes. The main difference ...
One important issue when designing with SADP/SAQP processes is how to lay out the boundary areas at the edges of an IP block, as defined by the SADP region marker. As shown in Figure 4, dummy ...
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